专利名称:Production method of sialon-based
phosphor, and sialon-based phosphor
发明人:Shin-ichi, Sakata Ube Laboratory, Co.Res.
Devel.,Takeshi, Yamao Ube Laboratory,Co.Res. Devel.,Tetsuo, Yamada UbeLaboratory, Co.Res. Devel.
申请号:EP04028384.8申请日:20041201公开号:EP1555307A3公开日:20081224
专利附图:
摘要:To provide a sialon-based phosphor capable of forming a thin film by mixing it
with a resin, and giving a uniform photoluminescent light with high light emissionintensity, and to provide a method for producing a sialon-based phosphor not havingexcessively large agglomerated particles and a wide particle size distribution, there isprovided a method for producing an α-sialon based phosphor represented by theformula: MxLnySi12-(m+n)Al(m+n)OnN16-n wherein M is at least onemetal selected from Ca, Mg, Y and Li, Ln is at least one lanthanide metal selected fromEu, Dy, Er, Tb, Yb and Ce, ax+by=m (assuming that the valence of metal M is a and thevalence of lanthanide metal Ln is b), 0
申请人:Ube Industries, Ltd.
地址:1978-96, O-Aza Kogushi Ube-shi, Yamaguchi-ken 755-8633 JP
国籍:JP
代理机构:Wössner, Gottfried
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