专利名称：Nitrogen-containing organic compound,
resist composition and patterning process
发明人：Takeru Watanabe,Takeshi Kinsho,Katsuya
Takemura,Akihiro Seki
申请号：US10974759申请日：20041028公开号：US07252925B2公开日：20070807
摘要：Resist compositions comprising nitrogen-containing organic compounds havinga benzimidazole structure and a specific ether chain moiety have an excellent resolution,form precisely configured patterns with minimized roughness of sidewalls and are usefulin microfabrication using electron beams or deep-UV light.
申请人：Takeru Watanabe,Takeshi Kinsho,Katsuya Takemura,Akihiro Seki
地址：Niigata-ken JP,Niigata-ken JP,Niigata-ken JP,Niigata-ken JP
国籍：JP,JP,JP,JP
代理机构：Birch, Stewart, Kolasch & Birch, LLP
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